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  Nanoscale stability of two- and three-dimensional defects in Cu/Ag–Mo thin films

Csiszár, G., Makvandi, A., & Mittemeijer, E. J. (2017). Nanoscale stability of two- and three-dimensional defects in Cu/Ag–Mo thin films. Journal of Applied Crystallography, 50(1), 152-171. doi:10.1107/S1600576716019129.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002E-093A-0 Version Permalink: https://hdl.handle.net/21.11116/0000-0003-B492-C
Genre: Journal Article

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 Creators:
Csiszár, Gábor1, Author           
Makvandi, Ardavan2, Author
Mittemeijer, Eric Jan1, 2, Author           
Affiliations:
1Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497650              
2Institut für Materialwissenschaften, Universität Stuttgart, Stuttgart, ou_persistent22              

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Free keywords: Emeriti and Others
 Abstract: -

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Language(s): eng - English
 Dates: 2017-02-01
 Publication Status: Published online
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1107/S1600576716019129
 Degree: -

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Title: Journal of Applied Crystallography
  Abbreviation : J. Appl. Cryst.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Oxford, England : Blackwell Publishing on behalf of the International Union of Crystallography
Pages: - Volume / Issue: 50 (1) Sequence Number: - Start / End Page: 152 - 171 Identifier: ISSN: 0021-8898
CoNE: https://pure.mpg.de/cone/journals/resource/954925410812