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Zusammenfassung:
We performed a systematic experimental study on the influence of the metal atom, the ligand combinations on the detailed photoreaction mechanism of organometallics for the two UV excimer laser wavelengths 248 nm and 193 nm with pulses of 16 ns duration. The influence of the ligand was studied in the TIBA, TEA, TMA system giving different photochemical reaction pathways, e.g. β-elimination and the formation of AlH molecules versus direct fission and formation of AlCH3 molecules. The results obtained for organometallics under isolated gas phase conditions are compared to the case when the organometallic is adsorbed to different surfaces, proving the influence of the environment. The influence of the mass of the metal atom was found in the gaseous Al(C2H5)3, Ga(C2H5)3, Te(C2H5)2 system, showing different yields for the β-elimination process under UV laser light. The effect of different ligand combinations from the group (H, Cl, CH3, C2H5) on the relative yields for the generation of Al metal atoms and molecules AlCH3, AlCl, AlH was determined at 193 nm, showing a possible way to reduce the source of carbon incorporation.
