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  Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications

Jeong, H.-H., Mark, A. G., Lee, T.-C., Son, K., Chen, W., Alarcón-Correa, M., et al. (2015). Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications. Advanced Science, 2(2): 1500016. doi:10.1002/advs.201500016.

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 Creators:
Jeong, H.-H.1, Author           
Mark, A. G.1, Author           
Lee, T.-C.1, 2, Author           
Son, K.3, Author           
Chen, W.4, 5, Author           
Alarcón-Correa, M.1, 6, Author           
Kim, I.1, 6, Author           
Schütz, G.3, Author           
Fischer, P.1, 6, Author           
Affiliations:
1Max Planck Research Group Micro, Nano, and Molecular Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497666              
2Institute for Materials Discovery, University College London, Kathleen Lonsdale Building, Gower Place, London WC1E 6BT, UK, ou_persistent22              
3Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648              
4Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497649              
5Department of Biophysical Chemistry, University of Heidelberg, INF 253, 69120 Heidelberg, Germany, ou_persistent22              
6Institute of Physical Chemistry, University of Stuttgart, Pfaffenwaldring 55, 70569 Stuttgart, Germany, ou_persistent22              

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Free keywords: Forschungsgruppe Fischer ; Abt. Schütz ; Abt. Spatz
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Language(s): eng - English
 Dates: 2015-05-06
 Publication Status: Published online
 Pages: 7
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1002/advs.201500016
 Degree: -

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Title: Advanced Science
  Abbreviation : Adv. Sci.
Source Genre: Journal
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Publ. Info: Weinheim : Wiley-VCH
Pages: - Volume / Issue: 2 (2) Sequence Number: 1500016 Start / End Page: - Identifier: ISSN: 2198-3844
CoNE: https://pure.mpg.de/cone/journals/resource/2198-3844