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  Plasmonic films based on colloidal lithography

Ai, B., Yu, Y., Möhwald, H., Zhang, G., & Yang, B. (2014). Plasmonic films based on colloidal lithography. Advances in Colloid and Interface Science, 206, 5-16. doi:10.1016/j.cis.2013.11.010.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0019-D87B-4 Version Permalink: https://hdl.handle.net/21.11116/0000-0007-D84E-F
Genre: Journal Article

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2034812.pdf (Publisher version), 3MB
 
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 Creators:
Ai, Bin, Author
Yu, Ye, Author
Möhwald, Helmuth1, Author           
Zhang, Gang, Author
Yang, Bai, Author
Affiliations:
1Helmuth Möhwald, Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863312              

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 Dates: 2014
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: ISI: 000336187100002
DOI: 10.1016/j.cis.2013.11.010
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Title: Advances in Colloid and Interface Science
  Other : Adv. Colloid Interface Sci.
Source Genre: Journal
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Publ. Info: Amsterdam : Elsevier
Pages: - Volume / Issue: 206 Sequence Number: - Start / End Page: 5 - 16 Identifier: ISSN: 0001-8686