English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
  A nondestructive analysis of the B diffusion in Ta-CoFeB-MgO-CoFeB-Ta magnetic tunnel junctions by hard x-ray photoemission

Kozina, X., Ouardi, S., Balke, B., Stryganyuk, G., Fecher, G. H., Felser, C., et al. (2010). A nondestructive analysis of the B diffusion in Ta-CoFeB-MgO-CoFeB-Ta magnetic tunnel junctions by hard x-ray photoemission. Applied Physics Letters, 96(7): 072105, pp. 1-3. doi:10.1063/1.3309702.

Item is

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Kozina, Xeniya1, Author
Ouardi, Siham1, Author
Balke, Benjamin1, Author
Stryganyuk, Gregory1, Author
Fecher, Gerhard H.1, Author
Felser, Claudia2, Author           
Ikeda, Shoji1, Author
Ohno, Hideo1, Author
Ikenaga, Eiji1, Author
Affiliations:
1external, ou_persistent22              
2External Organizations, ou_persistent22              

Content

show
hide
Free keywords: -
 Abstract: This work reports on hard x-ray photoelectron spectroscopy (HAXPES) of CoFeB based tunnel junctions. Aim is to explain the role of the boron diffusion for the observed improvement of the tunneling magnetoresistance ratio with increasing annealing temperature. The high bulk sensitivity of HAXPES was used as a nondestructive technique to analyze CoFeB-MgO-CoFeB magnetic tunnel junctions. The investigated samples were processed at different annealing temperatures from 523 to 923 K. Hard x-ray core level spectroscopy reveals an enforced diffusion of boron from the CoFeB into the adjacent Ta layer with increasing annealing temperature. The dependence of the tunneling magnetoresistance on the annealing temperature is explained by the combined effects of an improved crystalline structure together with a change in the spin polarization at the Fermi energy caused by the removal of boron from the CoFeB layer and Ta diffusion at high annealing temperature.

Details

show
hide
Language(s):
 Dates: 2010-02-15
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: ISI: 000274758100037
DOI: 10.1063/1.3309702
 Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show
hide
Title: Applied Physics Letters
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Melville, NY : American Institute of Physics
Pages: - Volume / Issue: 96 (7) Sequence Number: 072105 Start / End Page: 1 - 3 Identifier: Other: 0003-6951
CoNE: https://pure.mpg.de/cone/journals/resource/954922836223