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  Stability of thin wetting films on chemically nanostructured surfaces

Checco, A., Ocko, B. M., Tasinkevych, M., & Dietrich, S. (2012). Stability of thin wetting films on chemically nanostructured surfaces. Physical Review Letters, 109(16): 166101. doi:10.1103/PhysRevLett.109.166101.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000E-B340-A Version Permalink: https://hdl.handle.net/21.11116/0000-0007-F229-A
Genre: Journal Article

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 Creators:
Checco, A.1, Author
Ocko, B. M.1, Author
Tasinkevych, M.2, 3, Author           
Dietrich, S.2, 3, Author           
Affiliations:
1Condensed Matter Physics and Materials Science Department, Brookhaven National Laboratory, Upton, New York 11973, USA, ou_persistent22              
2Dept. Theory of Inhomogeneous Condensed Matter, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497643              
3Institut für Theoretische und Angewandte Physik, Universität StuttgartPfaffenwaldring 57, D-70569 Stuttgart, Germany, Pfaffenwaldring 57, D-70569 Stuttgart, Germany, ou_persistent22              

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Free keywords: Abt. Dietrich; wetting and capillarity
 Abstract: -

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Language(s): eng - English
 Dates: 2012-10-152012-10-19
 Publication Status: Issued
 Pages: 5
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1103/PhysRevLett.109.166101
 Degree: -

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Title: Physical Review Letters
Source Genre: Journal
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Publ. Info: Woodbury, N.Y., etc. : American Physical Society.
Pages: - Volume / Issue: 109 (16) Sequence Number: 166101 Start / End Page: - Identifier: ISSN: 0031-9007
CoNE: https://pure.mpg.de/cone/journals/resource/954925433406_1