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  Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations

Lehr, D., Helgert, M., Sundermann, M., Morhard, C., Pacholski, C., Spatz, J. P., et al. (2010). Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations. Optics Express, 18(23), 23878-23890. doi:10.1364/OE.18.023878.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4F93-3 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4F94-1
Genre: Journal Article

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 Creators:
Lehr, D.1, Author
Helgert, M.1, Author
Sundermann, M.1, Author
Morhard, C.2, Author           
Pacholski, C.2, Author           
Spatz, J. P.2, Author           
Brunner, R.1, Author
Affiliations:
1Biophysikalische Chemie, Universität Heidelberg. INF 253, 69120 Heidelberg; Carl Zeiss Jena GmbH, 07745 Jena; Carl Zeiss AG, 74447 Oberkochen; Friedrich-Schiller-Universität Jena, 07743 Jena FH Jena, 07745 Jena, ou_persistent22              
2Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497649              

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Free keywords: MPI für Intelligente Systeme; Abt. Spatz;
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Language(s): eng - English
 Dates: 2010
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 529516
DOI: 10.1364/OE.18.023878
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Title: Optics Express
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 18 (23) Sequence Number: - Start / End Page: 23878 - 23890 Identifier: -