Rigorous mathematical models for the reconstruction of thin films profiles from 
X-ray intensities

Slavyanov, S.; Ern, C.; Dosch, H.

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Rigorous mathematical models for the reconstruction of thin films profiles from X-ray intensities

Slavyanov, S., Ern, C., & Dosch, H. (2000). Rigorous mathematical models for the reconstruction of thin films profiles from X-ray intensities. In I. V. Andronov (Ed.), Proceedings of Days of Diffraction (pp. 161-167). St. Petersburg/Russia: SPbU.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-38B6-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-38B7-8

Genre: Conference Paper

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Creators:
Slavyanov, S., Author
Ern, C.¹, Author
Dosch, H.^{1, 2}, Author

Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645
2Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Dosch;

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Language(s): eng - English

Dates: Date issued: 2000

Publication Status: Issued

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Identifiers: eDoc: 198993

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Title: Proceedings of Days of Diffraction

Source Genre: Proceedings

Creator(s):
Andronov, I. V., Editor

Affiliations:
-

Publ. Info: St. Petersburg/Russia : SPbU

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 161 - 167 Identifier: -