Electromigration damage in mechanically deformed Al conductor lines: 
Dislocations as fast diffusion paths

Baker, S. P.; Yoo, Y. C.; Knauß, M. P.; Arzt, E.

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Electromigration damage in mechanically deformed Al conductor lines: Dislocations as fast diffusion paths

Baker, S. P., Yoo, Y. C., Knauß, M. P., & Arzt, E. (2000). Electromigration damage in mechanically deformed Al conductor lines: Dislocations as fast diffusion paths. Acta Materialia, 48, 2199-2208.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-375C-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-375D-D

Genre: Journal Article

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Creators:
Baker, S. P., Author
Yoo, Y. C., Author
Knauß, M. P., Author
Arzt, E.^{1, 2}, Author

Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655
2Universität Stuttgart, Institut für Metallkunde, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2000

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 42973

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Title: Acta Materialia

Source Genre: Journal

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Pages: - Volume / Issue: 48 Sequence Number: - Start / End Page: 2199 - 2208 Identifier: -