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  X-ray scattering from misfit dislocations in heteroepitaxial films: The case of Nb(110) on Al2O3

Barabash, R. I., Donner, W., & Dosch, H. (2001). X-ray scattering from misfit dislocations in heteroepitaxial films: The case of Nb(110) on Al2O3. Applied Physics Letters, 78(4), 443-445.

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Genre: Journal Article
Alternative Title : Appl. Phys. Lett.

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 Creators:
Barabash, R. I.1, Author
Donner, W.2, Author           
Dosch, H.2, 3, Author           
Affiliations:
1Univ Stuttgart, Inst Theoret & Angew Phys, D-70569 Stuttgart, Germany; Natl Tech Univ Ukraine, Kiev Polytech Inst, UA-252056 Kiev, Ukraine, ou_persistent22              
2Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
3Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Dosch;
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Language(s): eng - English
 Dates: 2001-01-22
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 21801
ISI: 000166477300018
 Degree: -

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Title: Applied Physics Letters
  Alternative Title : Appl. Phys. Lett.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 78 (4) Sequence Number: - Start / End Page: 443 - 445 Identifier: ISSN: 0003-6951