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  Diffusion of 195Au in amorphous Si3N4 and Si4N3

Voss, T., Matics, S., Strohm, A., Frank, W., & Bilger, G. (2001). Diffusion of 195Au in amorphous Si3N4 and Si4N3. Physica B, 308, 431-433.

Item is

Basic (Discarded)

Date of Discard: 2020-03-27
Comment: Dublette zu item_1573995
 Creators:
Voss, T.1           
Matics, S.1           
Strohm, A.1           
Frank, W.2           
Bilger, G.3
Affiliations:
1Dept. Theory of Inhomogeneous Condensed Matter, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497643              
2Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
3Univ Stuttgart, Inst Theoret & Angew Phys, D-70550 Stuttgart,; Germany; Univ Stuttgart, Inst Theoret & Angew Phys, D-70550 Stuttgart, Germany; Univ Stuttgart, Inst Phys Elekt, D-70550 Stuttgart, Germany; CERN, CH-1121 Geneva, Switzerland, ou_persistent22              
 Dates: 2001-12
Files: 0 Files
Locators: 0 Locators
version ID: item_1573999_1
Item State: Discarded
Name of Context: Import Context of the Max Planck Institute for Intelligent Systems, Affiliated to: Max Planck Institute for Intelligent Systems