Atomic diffusion from a material surface into a grain boundary

Antipov, Y. A.; Gao, H.

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Atomic diffusion from a material surface into a grain boundary

Antipov, Y. A., & Gao, H. (2002). Atomic diffusion from a material surface into a grain boundary. Proceedings of the Royal Society of London Series A, 458(2023), 1673-1694.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3077-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3078-B

Genre: Journal Article

Alternative Title : Proc. R. Soc. London Ser. A

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24-ga_2002.pdf (Abstract), 6KB

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Creators:
Antipov, Y. A.¹, Author
Gao, H.², Author

Affiliations:
1Univ Bath, Dept Math Sci, Bath BA2 7AY, Avon, England;, ou_persistent22
2Former Dept. Theory of Mesoscopic Phenomena, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497656

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Free keywords: MPI für Metallforschung; Ehem. Abt. Gao; 24-ga_2002; atomic diffusion; thin films; grain boundary; integro- differential equation; Riemann-Hilbert problem

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Language(s): eng - English

Dates: Date issued: 2002-07-01

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 6792
ISI: 000176563600007

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Title: Proceedings of the Royal Society of London Series A

Alternative Title : Proc. R. Soc. London Ser. A

Source Genre: Journal

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Pages: - Volume / Issue: 458 (2023) Sequence Number: - Start / End Page: 1673 - 1694 Identifier: ISSN: 1364-5021