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  What Drives Metal-Surface Step Bunching in Graphene Chemical Vapor Deposition?

Yi, D., Luo, D., Wang, Z.-J., Dong, J., Zhang, X., Willinger, M. G., et al. (2018). What Drives Metal-Surface Step Bunching in Graphene Chemical Vapor Deposition? Physical Review Letters, 120(24): 246101. doi:10.1103/PhysRevLett.120.246101.

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PhysRevLett.120.246101.pdf (Publisher version), 3MB
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PhysRevLett.120.246101.pdf
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 Creators:
Yi, Ding1, Author
Luo, Da1, Author
Wang, Zhu-Jun2, Author           
Dong, Jichen1, Author
Zhang, Xu1, Author
Willinger, Marc Georg2, Author           
Ruoff, Rodney S.1, 3, 4, Author
Ding, Feng1, 3, Author
Affiliations:
1Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan 44919, Republic of Korea, ou_persistent22              
2Inorganic Chemistry, Fritz Haber Institute, Max Planck Society, ou_24023              
3School of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea, ou_persistent22              
4Department of Chemistry, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea, ou_persistent22              

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 Abstract: Compressive strain relaxation of a chemical vapor deposition (CVD) grown graphene overlayer has been considered to be the main driving force behind metal surface step bunching (SB) in CVD graphene growth. Here,by combining theoretical studies with experimental observations, we prove that the SB canoccur even in the absence of a compressive strain, is enabled by the rapid diffusion of metal adatoms beneath the graphene and is driven by the release of the bending energy of the graphene overlayer in the vicinity of steps. Based on this new understanding, we explain a number of experimental observations such as the temperature dependence of SB, and how SB depends on the thickness of the graphene film. This study also shows that SB is a general phenomenon that can occur in all substrates covered by films of two-dimensional (2D) materials.

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Language(s): eng - English
 Dates: 2018-01-012018-06-122018-06-15
 Publication Status: Issued
 Pages: 5
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1103/PhysRevLett.120.246101
 Degree: -

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Title: Physical Review Letters
  Abbreviation : Phys. Rev. Lett.
Source Genre: Journal
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Publ. Info: Woodbury, N.Y. : American Physical Society
Pages: 5 Volume / Issue: 120 (24) Sequence Number: 246101 Start / End Page: - Identifier: ISSN: 0031-9007
CoNE: https://pure.mpg.de/cone/journals/resource/954925433406_1