On the structural development during ultrathin amorphous Al2O3 film growth on 
Al(111) and Al(100) surfaces by thermal oxidation

Flötotto, David; Wang, Zumin; Mittemeijer, Eric Jan

doi:10.1016/j.susc.2014.11.008

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On the structural development during ultrathin amorphous Al₂O₃ film growth on Al(111) and Al(100) surfaces by thermal oxidation

Flötotto, D., Wang, Z., & Mittemeijer, E. J. (2015). On the structural development during ultrathin amorphous Al₂O₃ film growth on Al(111) and Al(100) surfaces by thermal oxidation. Surface Science, 633, 1-7. doi:10.1016/j.susc.2014.11.008.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002C-AA74-B Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-55B9-D

Genre: Journal Article

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Creators:
Flötotto, David¹, Author
Wang, Zumin¹, Author
Mittemeijer, Eric Jan^{1, 2}, Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644
2Institut für Materialwissenschaft, Universität Stuttgart, Heisenbergstraße 3, 70569 Stuttgart, Germany, ou_persistent22

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Free keywords: Abt. Mittemeijer

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Language(s): eng - English

Dates: Published Online: 2015-03Date issued: 2015

Publication Status: Issued

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Rev. Type: Peer

Identifiers: DOI: 10.1016/j.susc.2014.11.008

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Title: Surface Science

Abbreviation : Surf. Sci.

Source Genre: Journal

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Publ. Info: Amsterdam : Elsevier

Pages: - Volume / Issue: 633 Sequence Number: - Start / End Page: 1 - 7 Identifier: Other: 0039-6028
CoNE: https://pure.mpg.de/cone/journals/resource/0039-6028