Sputter depth profiling: past, present, and future

Hofmann, Siegfried

doi:10.1002/sia.5489

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Sputter depth profiling: past, present, and future

Hofmann, S. (2014). Sputter depth profiling: past, present, and future. Surface and Interface Analysis, 46(10-11), 654-662. doi:10.1002/sia.5489.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-B4BC-8 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-B4BD-6

Genre: Journal Article

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Creators:
Hofmann, Siegfried¹, Author

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1Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497650

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Free keywords: Emeriti and Others

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Language(s): eng - English

Dates: Date issued: 2014

Publication Status: Issued

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Identifiers: DOI: 10.1002/sia.5489

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Title: Surface and Interface Analysis

Source Genre: Journal

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Publ. Info: New York, NY : John Wiley & Sons

Pages: - Volume / Issue: 46 (10-11) Sequence Number: - Start / End Page: 654 - 662 Identifier: ISSN: 0142-2421
CoNE: https://pure.mpg.de/cone/journals/resource/954925471358