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  Imposition of defined states of stress on thin films by a wafer-curvature method; validation and application to aging Sn films

Stein, J., Pascher, M., Welzel, U., Huegel, W., & Mittemeijer, E.-J. (2014). Imposition of defined states of stress on thin films by a wafer-curvature method; validation and application to aging Sn films. Thin Solid Films, 568, 52-57. doi:10.1016/j.tsf.2014.08.007.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-AFEF-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-AFF0-C
Genre: Journal Article

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 Creators:
Stein, Jendrik1, 2, Author           
Pascher, M.3, Author
Welzel, Udo1, Author           
Huegel, W.2, Author
Mittemeijer, Eric-Jan1, 4, Author           
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Robert Bosch GmbH, ou_persistent22              
3Institut für Materialwissenschaft; Universität Stuttgart, ou_persistent22              
4Institut für Materialwissenschaft, Universität Stuttgart, ou_persistent22              

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Free keywords: Abt. Mittemeijer
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Language(s): eng - English
 Dates: 2014
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/j.tsf.2014.08.007
 Degree: -

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Title: Thin Solid Films
  Abbreviation : Thin Solid Films
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Lausanne, Switzerland, etc. : Elsevier
Pages: - Volume / Issue: 568 Sequence Number: - Start / End Page: 52 - 57 Identifier: ISSN: 0040-6090
CoNE: https://pure.mpg.de/cone/journals/resource/954925449792