A Polyurethane-Based Positive Photoresist

Garcia-Fernandez, Luis; Specht, A.; del Campo, Aranzazu

doi:10.1002/marc.201400331

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A Polyurethane-Based Positive Photoresist

Garcia-Fernandez, L., Specht, A., & del Campo, A. (2014). A Polyurethane-Based Positive Photoresist. Macromolecular Rapid Communications, 35(20), 1801-1807. doi:10.1002/marc.201400331.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-4EA2-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-4EA3-3

Genre: Journal Article

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Creators:
Garcia-Fernandez, Luis¹, Author
Specht, A., Author
del Campo, Aranzazu¹, Author

Affiliations:
1Minerva Group del Campo: Dynamic Biointerfaces, MPI for Polymer Research, Max Planck Society, ou_1800291

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Language(s): eng - English

Dates: Date issued: 2014

Publication Status: Issued

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Identifiers: DOI: 10.1002/marc.201400331

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Title: Macromolecular Rapid Communications

Source Genre: Journal

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Publ. Info: Zug : Hüthig & Wepf Verlag

Pages: - Volume / Issue: 35 (20) Sequence Number: - Start / End Page: 1801 - 1807 Identifier: ISSN: 1022-1336
CoNE: https://pure.mpg.de/cone/journals/resource/954928543203