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  Effect of chemical etching on poly(methyl methacrylate) irradiated with slow highly charged ions

Ritter, R., Wilhelm, R. A., Ginzel, R., Schadauer, P., Heller, R., Rupp, W., et al. (2013). Effect of chemical etching on poly(methyl methacrylate) irradiated with slow highly charged ions. Physica Scripta T, 156: 014065, 1-3. doi:10.1088/0031-8949/2013/T156/014065.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0014-BB17-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0014-BB19-5
Genre: Conference Paper

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 Creators:
Ritter, Robert, Author
Wilhelm, Richard A, Author
Ginzel, Rainer1, Author           
Schadauer, Philip, Author
Heller, René, Author
Rupp, Werner, Author
Crespo López-Urrutia, José R.1, Author           
Facsko, Stefan, Author
Aumayr, Friedrich, Author
Affiliations:
1Division Prof. Dr. Joachim H. Ullrich, MPI for Nuclear Physics, Max Planck Society, ou_904547              

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Language(s): eng - English
 Dates: 2013-09-23
 Publication Status: Published online
 Pages: 6
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1088/0031-8949/2013/T156/014065
 Degree: -

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Title: 16th International Conference on the Physics of Highly Charged Ions
Place of Event: Heidelberg
Start-/End Date: 2012-09-02 - 2012-09-07

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Title: Physica Scripta T
  Other : Phys.Scr.T
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Stockholm : Royal Swedish Academy of Sciences
Pages: - Volume / Issue: 156 Sequence Number: 014065 Start / End Page: 1 - 3 Identifier: ISSN: 0281-1847
CoNE: https://pure.mpg.de/cone/journals/resource/110976549881403