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  The effect of magnetocrystalline anisotropy on the domain structure of patterned Fe2CrSi Heusler alloy thin films

Miyawaki, T., Foerster, M., Finizio, S., Vaz, C. A. F., Mawass, M.-A., Inagaki, K., et al. (2013). The effect of magnetocrystalline anisotropy on the domain structure of patterned Fe2CrSi Heusler alloy thin films. Journal of Applied Physcis, 114(7): 073905. doi:10.1063/1.4818800.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0014-B346-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0014-B38C-5
Genre: Journal Article

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 Creators:
Miyawaki, T.1, Author
Foerster, M.2, Author
Finizio, S.2, Author
Vaz, C. A. F.2, 3, Author
Mawass, M.-A.2, 4, Author           
Inagaki, K.1, Author
Fukatani, N.1, Author
Le Guyader, L.5, Author
Nolting, F.5, Author
Ueda, K.1, Author
Asano, H.1, Author
Kläui, M.2, Author
Affiliations:
1Department of Crystalline Materials Science, Nagoya University, Nagoya 464-8603, Japan, ou_persistent22              
2Institut für Physik, Johannes Gutenberg-Universität Mainz, 55099 Mainz, Germany, ou_persistent22              
3SwissFEL, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland, ou_persistent22              
4Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648              
5Swiss Light Source, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland, ou_persistent22              

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Free keywords: Abt. Schütz
 Abstract: -

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Language(s): eng - English
 Dates: 2013
 Publication Status: Issued
 Pages: 5
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1063/1.4818800
 Degree: -

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Title: Journal of Applied Physcis
  Abbreviation : J. Appl. Phys.
Source Genre: Journal
 Creator(s):
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Publ. Info: New York, NY : American Institute of Physics
Pages: - Volume / Issue: 114 (7) Sequence Number: 073905 Start / End Page: - Identifier: ISSN: 0021-8979
CoNE: https://pure.mpg.de/cone/journals/resource/991042723401880_1