Model-based monitoring and control of a monoclonal antibody production process

Biener, R. K.; Waldraff, W.; Noé, W.; Howaldt, W.; Gilles, Ernst Dieter

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Model-based monitoring and control of a monoclonal antibody production process

Biener, R. K., Waldraff, W., Noé, W., Howaldt, W., & Gilles, E. D. (1995). Model-based monitoring and control of a monoclonal antibody production process. In R. D. Schmid (Ed.), Biochemical engineering 3 (pp. 159-161). Stuttgart: E. Kurz and Co.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0013-A408-6 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0023-FB75-E

Genre: Book Chapter

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Creators:
Biener, R. K., Author
Waldraff, W., Author
Noé, W., Author
Howaldt, W., Author
Gilles, Ernst Dieter¹, Author

Affiliations:
1Other publications of the MPI staff, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society, ou_1738149

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Language(s): eng - English

Dates: Date issued: 1995

Publication Status: Issued

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Identifiers: eDoc: 118313

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Title: Biochemical engineering 3

Source Genre: Book

Creator(s):
Schmid, R. D., Editor

Affiliations:
-

Publ. Info: Stuttgart : E. Kurz and Co

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 159 - 161 Identifier: -