Ion beam lithography for Fresnel zone plates in X-ray microscopy

Keskinbora, K.; Grévent, C.; Bechtel, M.; Weigand, M.; Goering, E.; Nadzeyka, A.; Lloyd, P.; Rehbein, S.; Schneider, G.; Follath, R.; Vila-Comamala, J.; Yan, H.; Schütz, G.

doi:10.1364/OE.21.011747

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Ion beam lithography for Fresnel zone plates in X-ray microscopy

Keskinbora, K., Grévent, C., Bechtel, M., Weigand, M., Goering, E., Nadzeyka, A., et al. (2013). Ion beam lithography for Fresnel zone plates in X-ray microscopy. Optics Express, 21(10), 11747-11756. doi:10.1364/OE.21.011747.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0013-769F-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0013-76A0-1

Genre: Journal Article

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Creators:
Keskinbora, K.¹, Author
Grévent, C.¹, Author
Bechtel, M.¹, Author
Weigand, M.¹, Author
Goering, E.¹, Author
Nadzeyka, A.², Author
Lloyd, P.², Author
Rehbein, S.³, Author
Schneider, G.³, Author
Follath, R.³, Author
Vila-Comamala, J.⁴, Author
Yan, H.⁵, Author
Schütz, G.¹, Author

Affiliations:
1Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648
2Raith GmbH, 44263 Dortmund, Germany, ou_persistent22
3HZB BESSY II, Albert-Einstein-Str. 15, 15489 Berlin, Germany, ou_persistent22
4Advanced Photon Source, Argonne National Laboratory, 9700 South Cass Ave., Argonne, IL 60439, USA, ou_persistent22
5National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, USA, ou_persistent22

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Free keywords: Abt. Schütz

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Language(s): eng - English

Dates: Date issued: 2013

Publication Status: Issued

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Rev. Type: Peer

Identifiers: DOI: 10.1364/OE.21.011747

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Title: Optics Express

Source Genre: Journal

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Publ. Info: Washington, DC : Optical Society of America

Pages: 10 Volume / Issue: 21 (10) Sequence Number: - Start / End Page: 11747 - 11756 Identifier: ISSN: 1094-4087
CoNE: https://pure.mpg.de/cone/journals/resource/954925609918