TiO2 and HfO2 in electrolyte-oxide-silicon configuration for applications in 
bioelectronics

Wallrapp, F.; Fromherz, P.

Local TagsRelease HistoryDetailsSummary

TiO2 and HfO2 in electrolyte-oxide-silicon configuration for applications in bioelectronics

Wallrapp, F., & Fromherz, P. (2006). TiO2 and HfO2 in electrolyte-oxide-silicon configuration for applications in bioelectronics. Journal of Applied Physics, 99(11): 114103.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-62C9-8 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-62CA-6

Genre: Journal Article

Alternative Title : J. Appl. Phys.

Files

show Files

Locators

show

Creators

show

hide

Creators:
Wallrapp, F.¹, Author
Fromherz, P.¹, Author

Affiliations:
1Fromherz, Peter / Membrane and Neurophysics, Max Planck Institute of Biochemistry, Max Planck Society, ou_1565146

Content

show

Details

show

hide

Language(s): eng - English

Dates: Published Online: 2006-06-01

Publication Status: Published online

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: Peer

Identifiers: eDoc: 287994
ISI: 000238314900072

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: Journal of Applied Physics

Alternative Title : J. Appl. Phys.

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: 99 (11) Sequence Number: 114103 Start / End Page: - Identifier: ISSN: 0021-8979