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  Support effects on the atomic structure of ultrathin silica films on metals

Yu, X., Yang, B., Boscoboinik, A., Shaikhutdinov, S. K., & Freund, H.-J. (2012). Support effects on the atomic structure of ultrathin silica films on metals. Applied Physics Letters, 100(15): 151608. doi:10.1063/1.3703609.

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 Creators:
Yu, Xin1, Author           
Yang, Bing1, Author           
Boscoboinik, Anibal1, Author           
Shaikhutdinov, Shamil Kamilovich1, Author           
Freund, Hans-Joachim1, Author           
Affiliations:
1Chemical Physics, Fritz Haber Institute, Max Planck Society, ou_24022              

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Free keywords: atomic structure, crystal structure, infrared spectra, photoelectron spectra, reflectivity, scanning tunnelling microscopy, silicon compounds, thin films
 Abstract: We studied the atomic structure of ultrathin silica films on Pt(111) in comparison with the previously studied films on Mo(112) and Ru(0001). The results obtained by scanning tunneling microscopy, photoelectron spectroscopy, and infrared reflection absorption spectroscopy suggest that the metal-oxygen bond strength plays the decisive role in the atomic structure of the silica overlayers on metal substrates. Metals with high oxygen adsorption energy favor the formation of the crystalline monolayer SiO2.5 films, whereas noble metals form primarily vitreous SiO2 bilayer films. The metals with intermediate energies may form either of the structures or both coexisting. In the systems studied, the lattice mismatch plays only a minor role.

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Language(s): eng - English
 Dates: 2012-02-132011-03-252012-04-132012-04-09
 Publication Status: Issued
 Pages: 4
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1063/1.3703609
 Degree: -

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Title: Applied Physics Letters
Source Genre: Journal
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Publ. Info: Melville, NY : American Institute of Physics
Pages: - Volume / Issue: 100 (15) Sequence Number: 151608 Start / End Page: - Identifier: ISSN: 0003-6951
CoNE: https://pure.mpg.de/cone/journals/resource/954922836223