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  Nanoscale planar faulting in nanocrystalline Ni-W thin films: grain growth, segregation, and residual stress

Welzel, U., Kümmel, J., Bischoff, E., Kurz, S., & Mittemeijer, E. J. (2011). Nanoscale planar faulting in nanocrystalline Ni-W thin films: grain growth, segregation, and residual stress. Journal of Materials Research, 26, 2558-2573. doi:10.1557/jmr.2011.238.

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 Creators:
Welzel, U.1, Author           
Kümmel, J.1, Author           
Bischoff, E.1, Author           
Kurz, S.1, Author           
Mittemeijer, E. J.1, 2, Author           
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22              

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Free keywords: MPI für Intelligente Systeme; Abt. Mittemeijer;
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Language(s): eng - English
 Dates: 2011
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 579768
DOI: 10.1557/jmr.2011.238
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Title: Journal of Materials Research
Source Genre: Journal
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Pages: - Volume / Issue: 26 Sequence Number: - Start / End Page: 2558 - 2573 Identifier: -