Simon Charles Moss

Schönfeld, Bernd; Wochner, Peter

doi:10.1107/S0021889811019091

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Simon Charles Moss

Schönfeld, B., & Wochner, P. (2011). Simon Charles Moss. Journal of Applied Crystallography, 44, 887-888. doi:10.1107/S0021889811019091.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4C7F-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4C80-7

Genre: Journal Article

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Creators:
Schönfeld, Bernd¹, Author
Wochner, Peter², Author

Affiliations:
1ETH Zürich, Metal Physics and Technology, ou_persistent22
2Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645

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Free keywords: MPI für Intelligente Systeme; Abt. Dosch/Rühle;

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Language(s): eng - English

Dates: Date issued: 2011-08

Publication Status: Issued

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Rev. Type: Internal

Identifiers: eDoc: 571966
DOI: 10.1107/S0021889811019091

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Title: Journal of Applied Crystallography

Source Genre: Journal

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Pages: - Volume / Issue: 44 Sequence Number: - Start / End Page: 887 - 888 Identifier: -