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  Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes

Nadzeyka, A., Peto, L., Bauerdick, S., Mayer, M., Keskinbora, K., Grévent, C., et al. (2012). Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes. Special Issue: Micro- and Nano-Engineering (MNE) Sept. 19-23, 2011, Berlin, selected contributions: Part II, 198-201. doi:10.1016/j.mee.2012.07.036.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4BB2-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4BB3-E
Genre: Journal Article

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 Creators:
Nadzeyka, A.1, Author
Peto, L.1, Author
Bauerdick, S.1, Author
Mayer, M.2, Author           
Keskinbora, K.2, Author           
Grévent, C.2, Author           
Weigand, M.2, Author           
Hirscher, M.2, Author           
Schütz, G.2, Author           
Affiliations:
1Raith GmbH, Dortmund 44263, Germany, ou_persistent22              
2Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648              

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Free keywords: MPI für Intelligente Systeme; Abt. Schütz;
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Language(s): eng - English
 Dates: 2012
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 618623
DOI: 10.1016/j.mee.2012.07.036
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Title: Special Issue: Micro- and Nano-Engineering (MNE) Sept. 19-23, 2011, Berlin, selected contributions: Part II
Source Genre: Issue
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Publ. Info: -
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 198 - 201 Identifier: -

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Title: Microelectronic Engineering
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 98 Sequence Number: - Start / End Page: - Identifier: -