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  Electron energy-loss spectroscopy study of a multilayered SiOx and SiOxCy film prepared by plasma-enhanced chemical vapor deposition

Zhang, Z., Wagner, T., Sigle, W., & Schulz, A. (2006). Electron energy-loss spectroscopy study of a multilayered SiOx and SiOxCy film prepared by plasma-enhanced chemical vapor deposition. Journal of Materials Research, 21, 608-612.

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Genre: Journal Article
Alternative Title : J. Mater. Res.

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 Creators:
Zhang, Z.1, Author           
Wagner, T.2, Author           
Sigle, W.1, 3, Author           
Schulz, A.4, Author
Affiliations:
1Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              
2Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640              
3Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
4Institut für Plasmaforschung, Universität Stuttgart, Stuttgart, Germany, ou_persistent22              

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Free keywords: MPI für Metallforschung; Emeriti and Others; Stuttgart Center for Electron Microscopy (StEM); Abt. Arzt;
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Language(s): eng - English
 Dates: 2006
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 292948
 Degree: -

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Title: Journal of Materials Research
  Alternative Title : J. Mater. Res.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 21 Sequence Number: - Start / End Page: 608 - 612 Identifier: -