Structural rearrangements during the initial growth stages of organic thin 
films of F16CuPc on SiO2

de Oteyza, D. G; Barrena, E.; Sellner, S.; Oriol Osso, J.; Dosch, H.

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Structural rearrangements during the initial growth stages of organic thin films of F₁₆CuPc on SiO₂

de Oteyza, D. G., Barrena, E., Sellner, S., Oriol Osso, J., & Dosch, H. (2006). Structural rearrangements during the initial growth stages of organic thin films of F₁₆CuPc on SiO₂. Journal of Physical Chemistry B, 110, 16618-16623.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-45C4-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-45C5-0

Genre: Journal Article

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Creators:
de Oteyza, D. G¹, Author
Barrena, E.¹, Author
Sellner, S.¹, Author
Oriol Osso, J.², Author
Dosch, H.^{1, 3}, Author

Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645
2Institut für Theoretische und Angewandte Physik, Universität Stuttgart, 70550 Stuttgart, Germany; Institut de Ciencia de Materials de Barcelona, CSIC, 08193 Bellaterra, Spain, ou_persistent22
3Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Dosch;

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Language(s): eng - English

Dates: Date issued: 2006-06-27

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 287316

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Title: Journal of Physical Chemistry B

Source Genre: Journal

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Pages: - Volume / Issue: 110 Sequence Number: - Start / End Page: 16618 - 16623 Identifier: -