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  Diffusion reactions at Al-MgAl2O4 interfaces - and the effect of applied electric fields

Yu, Y., Mark, J., Ernst, F., Wagner, T., & Raj, R. (2006). Diffusion reactions at Al-MgAl2O4 interfaces - and the effect of applied electric fields. Journal of Materials Science, 41(23), 7785-7797.

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Genre: Journal Article
Alternative Title : J. Mater. Sci.

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 Creators:
Yu, Y.1, Author
Mark, J.1, Author
Ernst, F.2, Author           
Wagner, T.3, Author           
Raj, R.1, Author
Affiliations:
1Case Western Reserve Univ, Dept Mat Sci & Engn, Cleveland, OH 44106 USA, ou_persistent22              
2Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              
3Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640              

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Free keywords: MPI für Metallforschung; Abt. Arzt; ZWE Dünnschichtlabor;
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Language(s): eng - English
 Dates: 2006-12
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 297755
ISI: 000242825100016
 Degree: -

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Title: Journal of Materials Science
  Alternative Title : J. Mater. Sci.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 41 (23) Sequence Number: - Start / End Page: 7785 - 7797 Identifier: ISSN: 0022-2461