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  Thin tantalum-silicon-oxygen/tantalum-silicon-nitrogen films as high efficiency humidity diffusion barriers for solar cell encapsulation

Heuer, H., Wenzel, C., Herrmann, D., Hubner, R., Zhang, Z. L., & Bartha, J. W. (2006). Thin tantalum-silicon-oxygen/tantalum-silicon-nitrogen films as high efficiency humidity diffusion barriers for solar cell encapsulation. Thin Solid Films, 515(4), 1612-1617.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-44FF-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4500-A
Genre: Journal Article
Alternative Title : Thin Solid Films

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 Creators:
Heuer, H.1, Author
Wenzel, C.1, Author
Herrmann, D.1, Author
Hubner, R.1, Author
Zhang, Z. L.2, Author           
Bartha, J. W.1, Author
Affiliations:
1Tech Univ Dresden, IHM, D-01062 Dresden, Germany; ZSW Forsch, D-70565 Stuttgart, Germany; Leibniz Inst Festkorper & Werkstoffforsch Dresden, IFW, D-01069 Dresden, Germany, ou_persistent22              
2Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              

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Free keywords: MPI für Metallforschung; Emeriti and Others;
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Language(s): eng - English
 Dates: 2006-12-05
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 318153
ISI: 000242931900061
 Degree: -

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Title: Thin Solid Films
  Alternative Title : Thin Solid Films
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 515 (4) Sequence Number: - Start / End Page: 1612 - 1617 Identifier: ISSN: 0040-6090