SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

del Campo, A.; Greiner, C.

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SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

del Campo, A., & Greiner, C. (2007). SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography. Journal for Micromechanics and Microengineering, 17(6), R81-R95.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-43AB-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-43AC-B

Genre: Journal Article

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Creators:
del Campo, A.¹, Author
Greiner, C.¹, Author

Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2007

Publication Status: Issued

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Identifiers: eDoc: 319101

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Title: Journal for Micromechanics and Microengineering

Source Genre: Journal

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Pages: - Volume / Issue: 17 (6) Sequence Number: - Start / End Page: R81 - R95 Identifier: -