Transition from layer-by-layer to rapid roughening in the growth of DIP on SiO2

Zhang, X .N.; Barrena, E.; de Oteyza, D. G.; Dosch, H.

Local TagsRelease HistoryDetailsSummary

Transition from layer-by-layer to rapid roughening in the growth of DIP on SiO₂

Zhang, X.., Barrena, E., de Oteyza, D. G., & Dosch, H. (2007). Transition from layer-by-layer to rapid roughening in the growth of DIP on SiO₂. Surface Science, 601, 2420-2425.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-42C1-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0023-DA83-7

Genre: Journal Article

Files

show Files

Locators

show

Creators

show

hide

Creators:
Zhang, X .N.¹, Author
Barrena, E.¹, Author
de Oteyza, D. G.¹, Author
Dosch, H.^{1, 2}, Author

Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645
2Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22

Content

show

hide

Free keywords: MPI für Metallforschung; Abt. Dosch;

Abstract: -

Details

show

hide

Language(s): eng - English

Dates: Date issued: 2007-04-19

Publication Status: Issued

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: Peer

Identifiers: eDoc: 317290

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: Surface Science

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: 601 Sequence Number: - Start / End Page: 2420 - 2425 Identifier: -