Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model 
system for Ru-capped extreme ultraviolet lithography optics

He, Y.B; Goriachko, A.; Korte, C.; Farkas, A.; Mellau, G.; Dudin, P.; Gregoratti, L.; Barinov, A.; Kiskinova, M.; Stierle, A.; Kasper, N.; Bajt, S.; Over, H.

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Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics

He, Y., Goriachko, A., Korte, C., Farkas, A., Mellau, G., Dudin, P., et al. (2007). Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics. Journal of Physical Chemistry C, 111(24), 10988-10992.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-42A9-E Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-42AA-C

Genre: Journal Article

Alternative Title : J. Phys. Chem. C

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Creators:
He, Y.B¹, Author
Goriachko, A.², Author
Korte, C.², Author
Farkas, A.², Author
Mellau, G.², Author
Dudin, P.², Author
Gregoratti, L.², Author
Barinov, A.², Author
Kiskinova, M.², Author
Stierle, A.³, Author
Kasper, N.¹, Author
Bajt, S.², Author
Over, H.², Author

Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645
2Department of Physical Chemistry, Justus-Liebig-University, Heinrich-Buff-Ring, 35392 Giessen, Germany; Sincrotrone Trieste, Area Science Park, 34012 Basovizza-Trieste, Italy; Lawrence Livermore Laboratory, 700 East Avenue, Livermore, California 94550, USA, ou_persistent22
3Former Central Scientific Facility ANKA Synchroton Beamline, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497651

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Free keywords: MPI für Metallforschung; Abt. Dosch;

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Language(s): eng - English

Dates: Date issued: 2007-05-11

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 333648

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Title: Journal of Physical Chemistry C

Alternative Title : J. Phys. Chem. C

Source Genre: Journal

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Pages: - Volume / Issue: 111 (24) Sequence Number: - Start / End Page: 10988 - 10992 Identifier: -