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  Chemical bonds in damaged and pristine low-κ materials: A comparative EELS study

Stegmann, H., Özdöl, V. B., Koch, C., van Aken, P. A., Engelmann, J., Potapov, P., et al. (2008). Chemical bonds in damaged and pristine low-κ materials: A comparative EELS study. Microelectronic Engineering, 85, 2169-2171.

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 Creators:
Stegmann, H.1, Author
Özdöl, V. B.2, Author           
Koch, C.2, 3, Author           
van Aken, P. A.2, Author           
Engelmann, J.1, Author
Potapov, P.1, Author
Zschech, E.1, Author
Affiliations:
1AMD Saxony LLC & Co., KG, Dresden, Germany; Carl Zeiss NTS GmbH, Innovation Center Dresden, Manfred-von-Ardenne-Ring 20E, 01099 Dresden, Germany, ou_persistent22              
2Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
3Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              

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Free keywords: MPI für Metallforschung; Stuttgart Center for Electron Microscopy (StEM);
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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 379416
 Degree: -

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Title: Twelfth European Workshop on Materials for Advanced Metallization 2008 (MAM2008)
Place of Event: Dresden, Germany
Start-/End Date: 2008-03-02 - 2008-03-05

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Title: Microelectronic Engineering
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 85 Sequence Number: - Start / End Page: 2169 - 2171 Identifier: -