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  Sub-0.5 eV EFTEM mapping using the Zeiss SESAM

Koch, C. T., Sigle, W., Nelayah, J., Gu, L., Srot, V., & van Aken, P. A. (2008). Sub-0.5 eV EFTEM mapping using the Zeiss SESAM. In M. Luysberg, K. Tillmann, & T. Weirich (Eds.), EMC2008, 14th European Microscopy Congress, Vol. 1: Instrumentation and Methods (pp. 447-448). Berlin [et al.]: Springer.

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 Creators:
Koch, C. T.1, 2, Author           
Sigle, W.1, 2, Author           
Nelayah, J.2, Author           
Gu, L.2, Author           
Srot, V.1, 2, Author           
van Aken, P. A.2, Author           
Affiliations:
1Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              
2Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              

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Free keywords: MPI für Intelligente Systeme; Stuttgart Center for Electron Microscopy (StEM);
 Abstract: -

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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Internal
 Identifiers: eDoc: 376641
DOI: 10.1007/978-3-540-85226-1_224
 Degree: -

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Title: 14th European Microscopy Congress
Place of Event: Aachen, Germany
Start-/End Date: 2008-09-01 - 2008-09-05

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Title: EMC2008, 14th European Microscopy Congress, Vol. 1: Instrumentation and Methods
Source Genre: Proceedings
 Creator(s):
Luysberg, M., Editor
Tillmann, K., Editor
Weirich, T., Editor
Affiliations:
-
Publ. Info: Berlin [et al.] : Springer
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 447 - 448 Identifier: -