Controlled fabrication of Cr/Si and Cr/SiGe tubes tethered to insulator 
substrates

Cavallo, F.; Sigle, W.; Schmidt, O. G.

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Controlled fabrication of Cr/Si and Cr/SiGe tubes tethered to insulator substrates

Cavallo, F., Sigle, W., & Schmidt, O. G. (2008). Controlled fabrication of Cr/Si and Cr/SiGe tubes tethered to insulator substrates. Journal of Applied Physics, 103: 116103.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4065-3 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-4066-1

Genre: Journal Article

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Creators:
Cavallo, F.¹, Author
Sigle, W.^{2, 3}, Author
Schmidt, O. G.⁴, Author

Affiliations:
1Max Planck Society, ou_persistent13
2Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657
3Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669
4Institute for Integrative Nanosciences, IFW Dresden, Helmholtzstrasse 20, D-01069 Dresden, ou_persistent22

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Free keywords: MPI für Metallforschung; MPI für Festkörperforschung; Stuttgart Center for Electron Microscopy (StEM);

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Language(s): eng - English

Dates: Date issued: 2008

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 367438

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Title: Journal of Applied Physics

Source Genre: Journal

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Pages: - Volume / Issue: 103 Sequence Number: 116103 Start / End Page: - Identifier: -