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  Chemical bath deposition of thin TiO2-anatase films for dielectric applications

Zhou, L., Hoffmann, R. C., Zhao, Z., Bill, J., & Aldinger, F. (2008). Chemical bath deposition of thin TiO2-anatase films for dielectric applications. Thin Solid Films, 516, 7661-7666. doi:10.1016/j.tsf.2008.02.042.

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 Creators:
Zhou, L.1, Author           
Hoffmann, R. C.1, Author           
Zhao, Z.2, Author
Bill, J.3, Author           
Aldinger, F.1, 3, Author           
Affiliations:
1Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497654              
2Institut für Nichtmetallische Anorganische Materialien, Universtiät Stuttgart, Pulvermetallurgisches Laboratorium, Heisenbergstraße 3, 70569 Stuttgart, Germany; Department of Inorganic Chemistry, Arrhenius Laboratory, Stockholm University, 10691 Stockholm, Sweden, ou_persistent22              
3Universität Stuttgart, Institut für Nichtmetallische Anorganische Materialien, ou_persistent22              

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Free keywords: MPI für Metallforschung; Emeriti and Others; Abt. Aldinger;
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Language(s): eng - English
 Dates: 2008-03-05
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 374296
DOI: 10.1016/j.tsf.2008.02.042
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Title: Thin Solid Films
Source Genre: Journal
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Pages: - Volume / Issue: 516 Sequence Number: - Start / End Page: 7661 - 7666 Identifier: -