High-energy X-ray diffuse scattering

Ramsteiner, I. B.; Schöps, A.; Reichert, H.; Dosch, H.; Honkimäki, V.; Zhong, Z.; Hastings, J. B.

doi:10.1107/S0021889809011492

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High-energy X-ray diffuse scattering

Ramsteiner, I. B., Schöps, A., Reichert, H., Dosch, H., Honkimäki, V., Zhong, Z., et al. (2009). High-energy X-ray diffuse scattering. Journal of Applied Crystallography, 42, 392-400. doi:10.1107/S0021889809011492.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3CEB-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3CEC-3

Genre: Journal Article

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Creators:
Ramsteiner, I. B.¹, Author
Schöps, A.¹, Author
Reichert, H.¹, Author
Dosch, H.^{1, 2}, Author
Honkimäki, V.³, Author
Zhong, Z.³, Author
Hastings, J. B.³, Author

Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645
2Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22
3European Synchrotron Radiation Facility, 38043 Grenoble, France; Brookhaven National Laboratory, Upton, NY 11973-5000, USA; Stanford Radiation Laboratory, Menlo Park, CA 94025, USA, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Dosch/Rühle;

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Language(s): eng - English

Dates: Date issued: 2009-05-14

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 430090
DOI: 10.1107/S0021889809011492

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Title: Journal of Applied Crystallography

Source Genre: Journal

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Pages: - Volume / Issue: 42 Sequence Number: - Start / End Page: 392 - 400 Identifier: -