Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned 
block copolymer Au nanoparticle template and gravity accelerated etching

Bauer, S.; Brunner, J. G.; Jha, H.; Yasukawa, Y.; Asoh, H.; Ono, S.; Böhm, H.; Spatz, J. P.; Schmuki, P.

doi:10.1016/j.elecom.2010.02.00

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Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned block copolymer Au nanoparticle template and gravity accelerated etching

Bauer, S., Brunner, J. G., Jha, H., Yasukawa, Y., Asoh, H., Ono, S., et al. (2010). Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned block copolymer Au nanoparticle template and gravity accelerated etching. Electrochemistry Communications, 12, 565-569. doi:10.1016/j.elecom.2010.02.00.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3BD2-3 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3BD3-1

Genre: Journal Article

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Creators:
Bauer, S.¹, Author
Brunner, J. G.¹, Author
Jha, H.¹, Author
Yasukawa, Y.¹, Author
Asoh, H.¹, Author
Ono, S.¹, Author
Böhm, H.², Author
Spatz, J. P.², Author
Schmuki, P.¹, Author

Affiliations:
1Biophysikalische Chemie, Universität Heidelberg. INF 253, 69120 Heidelberg; Institut für Werkstoffwissenschaft, Universität Erlangen-Nürnberg, 91058 Erlangen; Department of Applied Chemistry, Kogakuin University, 2665-1 Nakano, Hachioji, Tokyo 192-0015, Japan, ou_persistent22
2Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497649

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Free keywords: MPI für Intelligente Systeme; Abt. Spatz;

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Language(s): eng - English

Dates: Date issued: 2010

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 480035
DOI: 10.1016/j.elecom.2010.02.00

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Title: Electrochemistry Communications

Source Genre: Journal

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Pages: - Volume / Issue: 12 Sequence Number: - Start / End Page: 565 - 569 Identifier: -