Characterization of ytterbium silicide formed in ultra high vacuum

Łaszcz, A.; Ratajczak, J.; Czerwinski, A.; Kątcki, J.; Srot, V.; Phillipp, F.; van Aken, P. A.; Yarekha, D.; Reckinger, N.; Larrieu, G.; Dubois, E.

doi:10.1088/1742-6596/209/1/012056

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Characterization of ytterbium silicide formed in ultra high vacuum

Łaszcz, A., Ratajczak, J., Czerwinski, A., Kątcki, J., Srot, V., Phillipp, F., et al. (2010). Characterization of ytterbium silicide formed in ultra high vacuum. Journal of Physics: Conference Series, 209: 012056.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3B75-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3B76-2

Genre: Conference Paper

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Creators:
Łaszcz, A.¹, Author
Ratajczak, J.¹, Author
Czerwinski, A.¹, Author
Kątcki, J.¹, Author
Srot, V.², Author
Phillipp, F.², Author
van Aken, P. A.², Author
Yarekha, D.¹, Author
Reckinger, N.¹, Author
Larrieu, G.¹, Author
Dubois, E.¹, Author

Affiliations:
1Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland;IEMN/ISEN, UMRS CNRS 8520, Avenue Poincare, Cite Scientifique, BP 69, 59652 Villeneuve d’Ascq Cedex, France;Université catholique de Louvain, Place du Levant 3, B-1348 Louvain-la-Neuve, Belgium., ou_persistent22
2Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669

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Free keywords: MPI für Metallforschung; Stuttgart Center for Electron Microscopy (StEM);

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Language(s): eng - English

Dates: Date issued: 2010

Publication Status: Issued

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Identifiers: eDoc: 466661
DOI: 10.1088/1742-6596/209/1/012056

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Title: 16th International Conference on Microscopy of Semiconducting Materials

Place of Event: Oxford, United Kingdom

Start-/End Date: 2009-03-17 - 2009-03-20

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Title: Journal of Physics: Conference Series

Source Genre: Journal

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Pages: - Volume / Issue: 209 Sequence Number: 012056 Start / End Page: - Identifier: -