Microstructural evolution of ion-bombarded copper thin films

Wagner, T.; Müller, D.

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Microstructural evolution of ion-bombarded copper thin films

Wagner, T., & Müller, D. (2000). Microstructural evolution of ion-bombarded copper thin films. In S. Moss (Ed.), Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing (pp. 85-90). Warrendale/PA: Materials Research Society.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-39BC-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-39BD-3

Genre: Conference Paper

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Creators:
Wagner, T.¹, Author
Müller, D., Author

Affiliations:
1Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2000

Publication Status: Issued

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Identifiers: eDoc: 210869

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Title: Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing. Symposium

Place of Event: Boston, Mass

Start-/End Date: 1999-11-29 - 1999-12-01

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Title: Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing

Source Genre: Proceedings

Creator(s):
Moss, S., Editor

Affiliations:
-

Publ. Info: Warrendale/PA : Materials Research Society

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 85 - 90 Identifier: -

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Title: Materials Research Society Symposium Proceedings

Source Genre: Series

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Pages: - Volume / Issue: 585 Sequence Number: - Start / End Page: - Identifier: -