Nanostructure characterization by sputter depth profiling: Approaching 
monolayer resolution

Hofmann, S.

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Nanostructure characterization by sputter depth profiling: Approaching monolayer resolution

Hofmann, S. (2000). Nanostructure characterization by sputter depth profiling: Approaching monolayer resolution. In K. Yoshihara (Ed.), Fabrication and Characterization of Atomic Scale Structures. Proceedings of the 5th International Symposium on Advanced Physical Fields (pp. 563-569). Tsukuba/Japan: National Research Institute for Metals.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-391F-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3920-3

Genre: Conference Paper

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Creators:
Hofmann, S.¹, Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer;

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Language(s): eng - English

Dates: Date issued: 2000

Publication Status: Issued

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Table of Contents: -

Rev. Type: Peer

Identifiers: eDoc: 200614

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Title: 5th International Symposium on Advanced Physical Fields

Place of Event: Tsukuba, Japan

Start-/End Date: 2000-03-06 - 2000-03-09

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Title: Fabrication and Characterization of Atomic Scale Structures. Proceedings of the 5th International Symposium on Advanced Physical Fields

Source Genre: Proceedings

Creator(s):
Yoshihara, K., Editor

Affiliations:
-

Publ. Info: Tsukuba/Japan : National Research Institute for Metals

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 563 - 569 Identifier: -