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  Localized measurement of strains in damascene copper interconnects by convergent-beam electron diffraction

Nucci, J. A. R., Keller, R., Krämer, S., Volkert, C. A., & Gross, M. (2000). Localized measurement of strains in damascene copper interconnects by convergent-beam electron diffraction. In K. Maex, Y.-C. Joo, G. S. Oehrlein, S. Ogawa, & J. T. Wetzel (Eds.), Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics (pp. D 851-D 856). Warrendale: MRS.

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 Creators:
Nucci, J. A. R., Author
Keller, R., Author
Krämer, S.1, Author           
Volkert, C. A.2, Author           
Gross, M., Author
Affiliations:
1Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              
2Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              

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Free keywords: MPI für Metallforschung; Abt. Arzt;
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Language(s): eng - English
 Dates: 2000
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 199006
 Degree: -

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Title: Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics
Place of Event: San Francisco, Calif.
Start-/End Date: 2000-04-23 - 2000-04-27

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Title: Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics
Source Genre: Proceedings
 Creator(s):
Maex, K., Editor
Joo, Y-C., Editor
Oehrlein, G. S., Editor
Ogawa, S., Editor
Wetzel, J. T., Editor
Affiliations:
-
Publ. Info: Warrendale : MRS
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: D 851 - D 856 Identifier: -

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Title: Materials Research Society Symposia Proceedings
Source Genre: Series
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Publ. Info: -
Pages: - Volume / Issue: 612 Sequence Number: - Start / End Page: - Identifier: -