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  The role of delocalized nitrogen in determining the local atomic arrangement and mechanical properties of amorphous carbon nitride thin films

Holloway, B. C., Kraft, O., Shuh, D. K., Nix, W. D., Kelly, M., Pianetta, P., et al. (2000). The role of delocalized nitrogen in determining the local atomic arrangement and mechanical properties of amorphous carbon nitride thin films. Journal of Vacuum Science and Technology A, 18, 2964-2971.

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 Creators:
Holloway, B. C., Author
Kraft, O.1, Author           
Shuh, D. K., Author
Nix, W. D., Author
Kelly, M., Author
Pianetta, P., Author
Hagström, S., Author
Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              

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Free keywords: MPI für Metallforschung; Abt. Arzt;
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 Dates: 2000
 Publication Status: Issued
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 Rev. Type: Peer
 Identifiers: eDoc: 199002
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Title: Journal of Vacuum Science and Technology A
Source Genre: Journal
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Pages: - Volume / Issue: 18 Sequence Number: - Start / End Page: 2964 - 2971 Identifier: -