µ-Spin rotation study of the temperature-dependent relaxation rate of acceptor 
centers in silicon

Mamedov, T. N.; Andrianov, D. G.; Herlach, D.; Gritsaj, K. I.; Gorelkin, V. N.; Kormann, O.; Major, J.; Stoykov, A. V.; Schefzik, M.; Zimmermann, U.

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µ^-Spin rotation study of the temperature-dependent relaxation rate of acceptor centers in silicon

Mamedov, T. N., Andrianov, D. G., Herlach, D., Gritsaj, K. I., Gorelkin, V. N., Kormann, O., et al. (2000). µ^-Spin rotation study of the temperature-dependent relaxation rate of acceptor centers in silicon. JETP Letters, 71, 438-441.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3822-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3823-5

Genre: Journal Article

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Mamedov, T. N., Author
Andrianov, D. G., Author
Herlach, D., Author
Gritsaj, K. I., Author
Gorelkin, V. N., Author
Kormann, O.¹, Author
Major, J.¹, Author
Stoykov, A. V., Author
Schefzik, M., Author
Zimmermann, U., Author

Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645

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Free keywords: MPI für Metallforschung; Abt. Dosch;

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Language(s): eng - English

Dates: Date issued: 2000

Publication Status: Issued

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Identifiers: eDoc: 198869

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Title: JETP Letters

Source Genre: Journal

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Pages: - Volume / Issue: 71 Sequence Number: - Start / End Page: 438 - 441 Identifier: -