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  A new approach to understanding electromigration in Al(Cu) alloys on an atomistic basis

Schmidt, C., Dekker, J. P., Gumbsch, P., & Arzt, E. (2001). A new approach to understanding electromigration in Al(Cu) alloys on an atomistic basis. In Y. Limoge (Ed.), Proceedings of DIMAT 2000, the Fifth International Conference on Diffusion in Materials (pp. 151-156). Uetikon-Zürich: Scitec Publications Ltd.

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 Creators:
Schmidt, C., Author
Dekker, J. P., Author
Gumbsch, P.1, Author           
Arzt, E.1, 2, Author           
Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              
2Universität Stuttgart, Institut für Metallkunde, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Arzt; atomistic simulation; electromigration; phenomenological equations; solute diffusion in Al(Cu)-alloys
 Abstract: -

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Language(s): eng - English
 Dates: 2001
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 21834
ISI: 000171690100024
 Degree: -

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Title: 5th International Conference on Diffusion in Materials (DIMAT 2000)
Place of Event: Paris, France
Start-/End Date: 2000-07-17 - 2000-07-21

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Title: Proceedings of DIMAT 2000, the Fifth International Conference on Diffusion in Materials
Source Genre: Proceedings
 Creator(s):
Limoge, Y., Editor
Affiliations:
-
Publ. Info: Uetikon-Zürich : Scitec Publications Ltd.
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 151 - 156 Identifier: -

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Title: Defect and Diffusion Forum
Source Genre: Series
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Publ. Info: -
Pages: - Volume / Issue: 194/199 Sequence Number: - Start / End Page: - Identifier: -