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  Self-diffusion of 71Ge in Si-Ge

Strohm, A., Voss, T., Frank, W., Raisanen, J., & Dietrich, M. (2001). Self-diffusion of 71Ge in Si-Ge. Physica B, 308, 542-545.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-33C4-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-33C5-5
Genre: Journal Article
Alternative Title : Physica B

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8-di_2001.pdf (Abstract), 52KB
 
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 Creators:
Strohm, A.1, Author           
Voss, T.1, Author           
Frank, W.2, Author           
Raisanen, J.3, Author
Dietrich, M.3, Author
Affiliations:
1Dept. Theory of Inhomogeneous Condensed Matter, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497643              
2Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
3Univ Stuttgart, Inst Theoret & Angew Phys, D-70550 Stuttgart, Germany; Univ Jyvaskyla, Dept Phys, FIN-40351 Jyvaskyla, Finland; Univ Saarland, D-66041 Saarbrucken, Germany, ou_persistent22              

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Free keywords: MPI für Intelligente Systeme; Abt. Dietrich; Abt. Dosch/Rühle; Miscellaneous; Si-Ge epi-layers; Ge-71 self-diffusion; radiotracer technique; transition from interstitialcy to vacancy mechanism
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Language(s): eng - English
 Dates: 2001-12
 Publication Status: Issued
 Pages: -
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 Rev. Type: Peer
 Identifiers: eDoc: 20419
ISI: 000173660100136
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Title: Physica B
  Alternative Title : Physica B
Source Genre: Journal
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Pages: - Volume / Issue: 308 Sequence Number: - Start / End Page: 542 - 545 Identifier: ISSN: 0921-4526