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  Internal friction of copper thin layers on silicon substrates

von der Hagen, J., Weller, M., & Arzt, E. (2002). Internal friction of copper thin layers on silicon substrates. Defect and Diffusion in Metals: An Annual Retrospective IV, 285-288.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3286-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3287-8
Genre: Journal Article

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19-ar_2002.pdf (Abstract), 65KB
 
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 Creators:
von der Hagen, J.1, Author           
Weller, M.1, Author           
Arzt, E.1, 2, Author           
Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              
2Universität Stuttgart, Institut für Metallkunde, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Arzt; 19-ar_2002; copper films; core diffusion; dislocation relaxation; internal friction
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Language(s): eng - English
 Dates: 2002
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 6866
ISI: 000175228400028
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Title: Defect and Diffusion in Metals: An Annual Retrospective IV
Source Genre: Issue
 Creator(s):
Fisher, D. J., Editor
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-
Publ. Info: -
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 285 - 288 Identifier: -

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Title: Diffusion and Defect Forum
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 203-205 Sequence Number: - Start / End Page: - Identifier: -