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  Chemical liquid deposition of gallium nitride thin films on siloxane-anchored self-assembled monolayers

Niesen, T. P., Puchinger, M., Gerstel, P., Rodewald, D., Wolff, J., Wagner, T., et al. (2002). Chemical liquid deposition of gallium nitride thin films on siloxane-anchored self-assembled monolayers. Materials Chemistry and Physics, 73(2-3), 301-305.

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Genre: Journal Article
Alternative Title : Mater. Chem. Phys.

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17-ar_2002.pdf (Abstract), 60KB
 
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 Creators:
Niesen, T. P.1, Author           
Puchinger, M.2, Author           
Gerstel, P.1, Author           
Rodewald, D.3, Author
Wolff, J.3, Author
Wagner, T.4, Author           
Bill, J.5, Author           
Aldinger, F.1, 5, Author           
Affiliations:
1Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497654              
2Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              
3Siemens & Shell Solar GmbH, D-81739 Munich, Germany; Univ Stuttgart, Pulvermet Lab, Max Planck Inst Met Forsch, D-70569 Stuttgart, Germany; Univ Stuttgart, Inst Nichtmet Anorgan Mat, D-70569 Stuttgart, Germany;, ou_persistent22              
4Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640              
5Universität Stuttgart, Institut für Nichtmetallische Anorganische Materialien, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Aldinger; Abt. Arzt; Abt. Arzt; ZWE Dünnschichtlabor; 17-ar_2002; gallium nitride (GaN); thin films; self-assembled monolayers; chemical liquid deposition; precursor pyrolysis
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Language(s): eng - English
 Dates: 2002-01-15
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 28723
ISI: 000173252100030
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Title: Materials Chemistry and Physics
  Alternative Title : Mater. Chem. Phys.
Source Genre: Journal
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Pages: - Volume / Issue: 73 (2-3) Sequence Number: - Start / End Page: 301 - 305 Identifier: ISSN: 0254-0584