Electron-irradiation-induced amorphization in Mo/Si nano- multilayer material

Shioya, E.; Suda, T.; Watanabe, S.; Ohnuki, S.; Ishino, M.; Yoda, O.; Abe, H.; Phillipp, F.

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Electron-irradiation-induced amorphization in Mo/Si nano- multilayer material

Shioya, E., Suda, T., Watanabe, S., Ohnuki, S., Ishino, M., Yoda, O., et al. (2002). Electron-irradiation-induced amorphization in Mo/Si nano- multilayer material. Materials Transactions, 43(4), 650-653.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-31A9-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-31AB-F

Genre: Journal Article

Alternative Title : Mater. Trans.

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Creators:
Shioya, E.¹, Author
Suda, T.¹, Author
Watanabe, S.¹, Author
Ohnuki, S.¹, Author
Ishino, M.¹, Author
Yoda, O.¹, Author
Abe, H.¹, Author
Phillipp, F.², Author

Affiliations:
1Hokkaido Univ, Grad Sch Engn, Mat Sci Div, Sapporo, Hokkaido 0608628, Japan; Japan Atom Energy Res Inst, Kansai Res Estab, Kizu 6190215, Japan; Japan Atom Energy Res Inst, Takasaki Res Estab, Takasaki, Gumma 3701292, Japan; Japan Atom Energy Res Inst, Takasaki Res Estab, D-70569 Stuttgart, Germany;, ou_persistent22
2Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, DE, ou_1497657

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Free keywords: MPI für Metallforschung; Abt. Rühle; ZWE Hochspannungs-Mikroskopie; 66-ru_2002; multilayer; interface; electron-irradiation; amorphization; high-resolution electron microscope

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Language(s): eng - English

Dates: Date issued: 2002-04

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 6818
ISI: 000175971900010

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Title: Materials Transactions

Alternative Title : Mater. Trans.

Source Genre: Journal

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Pages: - Volume / Issue: 43 (4) Sequence Number: - Start / End Page: 650 - 653 Identifier: ISSN: 1345-9678